Lithography

Top Anti-reflective Coatings vs Bottom Anti-reflective Coatings

EUV

The biggest problem facing lithographers using EUV is the RLS trade-off: simultaneous improvement of resolution, line width roughness, and photosensitivity.

Directed self-assembly

Brewer Science is actively developing materials and processes for the most advanced DSA schemes, including high-χ (high-chi) block copolymers that enable feature sizes of less than 10 nm.

Multilayer Systems

​OptiStack® multilayer systems are our flagship lithography technology, and are used for leading-edge high volume IC manufacturing.

ARC® anti-reflective coating

ARC® anti-reflective coatings are the industry benchmark for reflection control and light absorption during photolithography.