It takes a company dedicated to precision and solutions to master the ability to control light. From seeing the need and taking the first steps, we took the industry to new heights by advancing the lithography process. Brewer Science continues to revolutionize lithography technologies including anti-reflective coatings and other key materials.
Our line of products stretches across the whole spectrum of lithography wavelengths and is the most comprehensive product lineup in the industry. Learn how Brewer Science can make the difference to your photolithography process.
The biggest problem facing lithographers using EUV is the RLS trade-off: simultaneous improvement of resolution, line width roughness, and photosensitivity.
Brewer Science is actively developing materials and processes for the most advanced DSA schemes, including high-χ (high-chi) block copolymers that enable feature sizes of less than 10 nm.
OptiStack® multilayer systems are our flagship lithography technology, and are used for leading-edge high volume IC manufacturing.
ARC® anti-reflective coatings are the industry benchmark for reflection control and light absorption during photolithography.